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卓越論壇(第7期)預告|Quantitative Analysis of Selective Evaporation Characteristics for Binary Mixture Droplets with SPR Imaging Technology (Seong Hyuk LEE)
發布時間:2024-01-09        作者:        編輯:賈繼偉       浏覽:

報告題目 Quantitative Analysis of Selective Evaporation Characteristics for Binary Mixture Droplets with SPR Imaging Technology

時間20241月10日(星期三)13:30-15:00

地點:機械材料館529

報告人Seong Hyuk LEE 韓國中央大學教授

主持人:辛元洙

報告人簡介

Seong Hyuk Lee教授是韓國中央大學教授,韓國中央大學多維電池研究所所長,韓國機械工程師協會熱流體部門副理事長,亞洲液體霧化和噴霧系統國際會議副主席,Institute for Liquid Atomization and Spray System KOREA的主編,許多國際期刊的副主編及委員。主持韓國國家能源部基金,韓國國家自然科學基金等科研項目30餘項,獲各種科研獎勵10餘項,在國内外重要期刊上發表學術論文100餘篇。研究領域包含計算流體力學與多物理場模拟蒸發與冷凝傳熱納米尺度能量輸運流動可視化等方面。


報告摘要

    The evaporation of droplet array has been used for a surface coating to manufacture printed electronics. During evaporation, various phenomena occur, such as contact line behavior, internal flow motions, and vapor transport. While the multiple droplets are evaporating, in particular, their mutual interactions suppress the local evaporation flux because of vapor accumulation. The decrease in local evaporation flux also affects the internal flow fields and local liquid concentration, especially for the binary mixture droplets (BMDs). For BMDs, more volatile components evaporate faster, and so-called selective evaporation occurs. The in-situ measurement of local concentration during evaporation is thus essential to understanding the solutal Marangoni flow motion inside BMDs, strongly related to the surface tension gradient. Today, the present talk introduces the quantitative analysis of selective evaporation that occurs while BMDs evaporate with the use of SPR imaging to measure the concentration near the wall. Also, this talk will show the dynamics of the contact line behavior of the multiple BMDs.


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